ALD-100 原子層沉積
具體成交價以合同協(xié)議為準(zhǔn)
- 公司名稱 SVT Associates
- 品牌
- 型號 ALD-100
- 產(chǎn)地 美國
- 廠商性質(zhì) 經(jīng)銷商
- 更新時間 2017/9/14 5:38:32
- 訪問次數(shù) 569
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MBE 分子束外延，PLD 脈沖激光沉積系統(tǒng)，ALD 原子層沉積系統(tǒng)在線，溫度測試系統(tǒng)，原位原子吸收能譜，CIGS太陽能薄膜沉積系統(tǒng)，Se源
The Advanced ALD system is a viscous flow-type reactor for ultra thin
film deposition. The growth process is controlled by a Windows-based
software package. The base model is equipped with two gas lines and
handles wafer size up to 12 ". With a compact footprint, all hardware
is enclosed in a negative pressure cabinet for safety more
information.
Applications
— High k dielectrics
— Nanocoatings
— Surface modification layers
— Device encapsulations
— Photonic crystals
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