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          上海巨納科技有限公司>>二維材料>>硫化物晶體>>SbAsS3 三硫化砷銻晶體

          SbAsS3 三硫化砷銻晶體

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          • SbAsS3 三硫化砷銻晶體

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          Our newest class of material: Sb2xAs2(1-x)S3 comes in perfect 1:1:3 stoichiometry consisting of Sb-Sb-S3 atoms.

          詳細(xì)介紹

          Our newest class of material: Sb2xAs2(1-x)S3 comes in perfect 1:1:3 stoichiometry consisting of Sb-Sb-S3 atoms. After 34 growth trials in a year, perfect stoichirometry, large single crystal domain size, minimal defect density (1 parts in 100,000 unit cells), and perfected purity level (99.9998%) are achieved. In the bulk form, antimony arsenic sulfide (SbAsS?) is a direct gap semiconductor and has band-gap at around 1.7 eV. Similar to molybdenum disulfide, it has layered structure (lamellar) with weak interlayer coupling and can be isolated down to monolayers. The monolayer thickness measures ~0.8 nm and the monolayer SbAsS? is waiting to be discovered both experimentally and theoretically. Our crystals are large in size ~5-8mm and show remarkable PL characteristics.
           
          Our crystals are grown by state-of-the-art growth techniques over 8 weeks and show high crystallinity. Raman spectrum displays very sharp and clear modes with FWHM less than 6cm-1. Single crystal SbAsS? comes ready for exfoliation and is ideal for 2D research.

          Summary: 
          Sb2xAs2(1-x)S3 alloys are created by alloying Sb into As2S3.
          Please specify your x value when ordering
          Space group: P21/c
          Layered: Yes / Exfoliates to monolayers
          Band gap: ~1.7 eV in bulk
          Purity: Semiconductor grade (6N) 99.9999%
          Growth technique: Vapor transport technique – Duration: 2.0 months
          Sample size: 5-10 mm

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